Central Cleanroom Facility
The Central Cleanroom facility occupies a floor area of 600 square meters including plant room, gas room and staff office. The plant room and gas room are equipped with facilities to support the operation of the cleanroom. The cleanroom provides class 100, class 1,000 and class 10,000 environments (ISO 5, 6 and 7 respectively).
Class 100 room is a yellow room, which is designed for doing photolithography. Photolithography is a process to transfer a mask pattern on to the substrate, such as silicon wafer. The pitch of the pattern can be as small as a few tens of micrometer, so photolithography should be performed in a particle free environment.
Device fabrication and measurement would be performed in class 1,000 and class 10,000 environment. Equipment includes thin film deposition system, ink-jet printing system, plasma etcher, wire bonder, probe station etc. Other facilities have solvent cabinet, chemical cabinet for acid/ base solution and refrigerator.
Dr. Terence Wong
Tel: +852 3400 2075
Ms. Joyce Lau
Tel: +852 3400 2076